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Scanning tunneling lithography of silicon nanoparticle films |
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| Authors: | P. Scheier and K. Sattler |
| Affiliation: | (1) Department of Physics and Astronomy, University of Hawaii at Manoa, 2505 Correa Road, Honolulu, HI 96822, USA |
| Abstract: | Monolayer and bi-layer silicon nanoparticle (SiNP) filmswith wide band gaps (up to 4 eV) have been produced in UHV withnarrow size distributions of particles with 2-4 nm diameters andwere studied using scanning tunneling microscopy (STM) andspectroscopy (STS). The films then were manipulated by applyingdifferent values for the tunneling resistance. Nanoparticlefusion and fission processes allow to shape the particles in thefilms in various ways and to write in white and black on thefilm template. |
| Keywords: | 81.16.Nd Nanolithography 36.40.-c Atomic andmolecular clusters 81.16.Ta Atom manipulation 73.22.-fElectronic structure of nanoscale materials: clusters,nanoparticles, nanotubes, and nanocrystals |
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