首页 | 本学科首页   官方微博 | 高级检索  
     检索      

GaAs/Al_xGa_(1-x)As多量子阱外延结构及其LP-MOCVD生长工艺研究
引用本文:胡伟,曾庆高,叶嗣荣,杨立峰.GaAs/Al_xGa_(1-x)As多量子阱外延结构及其LP-MOCVD生长工艺研究[J].光子学报,2017,46(3).
作者姓名:胡伟  曾庆高  叶嗣荣  杨立峰
作者单位:1. 重庆光电技术研究所,重庆,400060;2. 电子科技大学光电信息学院,成都,610054
基金项目:国家自然科学基金,中国博士后科学基金,四川省科技计划国际合作项目,中央高校基础科研业务费(No.ZYGX2014J047)资助 The National Natural Science Foundation of China,the China Postdoctoral Science Foundation,the Sichuan Provincial International Cooperation,the Fundamental Research Funds for the Central Universities
摘    要:在低压金属有机化学气相沉积生长工艺中,对用于制作850nm垂直腔面发射激光器件的GaAs/Al_xGa_(1-x)As多量子阱外延结构的生长温度、反应室压力、总载气流量以及生长速度等主要工艺参量进行优化,并进行了完整外延结构的生长.实验结果表明:在700℃条件下,得到多种组分的GaAs/Al_xGa_(1-x)As多量子阱结构,通过光致发光谱对比测试得到的最佳组分x为0.24,同时得到良好的表面形貌,最终确定的最佳生长速度为0.34~0.511nm/s.

关 键 词:金属有机化学气相沉积  生长温度  多量子阱  生长速度  外延结构

Epitaxial Structure of Multiple Quantum Well and Its LP-MOCVD Growth for GaAs/AlxGa1-xAs
HU Wei,ZENG Qing-gao,YE Si-rong,YANG Li-feng.Epitaxial Structure of Multiple Quantum Well and Its LP-MOCVD Growth for GaAs/AlxGa1-xAs[J].Acta Photonica Sinica,2017,46(3).
Authors:HU Wei  ZENG Qing-gao  YE Si-rong  YANG Li-feng
Abstract:The multiple quantum well structure for 850nm vertical cavity surface emitting laser device based on GaAs/AlxGa1-xAs has been design in this paper.The major process parameters of Low PressMetal Organic Chemical Vapor Deposition (LP-MOCVD),such as the growth temperature,the reaction chamber pressure,total carrier gas flow rate and so on,have been optimized and the growth of complete epitaxial structure has been carried out.The experimental results showed that components of the GaAs/ AlxGa1-xAs multiple quantum well structure devices was obtained under the condition of 700℃,the best composition x is 0.24 by the Photoluminescence (PL) spectrum comparison test and a good surface morphology of the multiple quantum well structure had been obtained.The optimum growth rategrowth rate was 0.34~0.511 nm/s ultimately.
Keywords:Metal organic chemical vapor deposition  Growth temperature  Multiple quantum well  Growth rate  Epitaxial structure
本文献已被 CNKI 万方数据 等数据库收录!
设为首页 | 免责声明 | 关于勤云 | 加入收藏

Copyright©北京勤云科技发展有限公司  京ICP备09084417号