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Site-Selective Oxidation of Monolayered Liquid-Exfoliated WS2 by Shielding the Basal Plane through Adsorption of a Facial Amphiphile
Authors:Sebastian Grieger  Beata M. Szydłowska  Vaishnavi J. Rao  Eva Steinmann  Marcus Dodds  Zahra Gholamvand  Georg S. Duesberg  Jana Zaumseil  Claudia Backes
Affiliation:1. Institute for Physical Chemistry, Ruprecht-Karls-Universität Heidelberg, Im Neuenheimer Feld 253, 69120 Heidelberg, Germany;2. Institute for Physical Chemistry, Ruprecht-Karls-Universität Heidelberg, Im Neuenheimer Feld 253, 69120 Heidelberg, Germany

Institute of Physics, EIT 2, Faculty of Electrical Engineering and Information Technology, Universität der Bundeswehr München, Werner-Heisenberg-Weg 39, 85577 Neubiberg, Germany;3. School of Physics and CRANN & AMBER Research Centres, Trinity College Dublin, Dublin, 2 Ireland;4. Institute of Physics, EIT 2, Faculty of Electrical Engineering and Information Technology, Universität der Bundeswehr München, Werner-Heisenberg-Weg 39, 85577 Neubiberg, Germany

Abstract:In recent years, various functionalization strategies for transition-metal dichalcogenides have been explored to tailor the properties of materials and to provide anchor points for the fabrication of hybrid structures. Herein, new insights into the role of the surfactant in functionalization reactions are described. Using the spontaneous reaction of WS2 with chloroauric acid as a model reaction, the regioselective formation of gold nanoparticles on WS2 is shown to be heavily dependent on the surfactant employed. A simple model is developed to explain the role of the chosen surfactant in this heterogeneous functionalization reaction. The surfactant coverage is identified as the crucial element that governs the dominant reaction pathway and therefore can severely alter the reaction outcome. This study shows the general importance of the surfactant choice and how detrimental or beneficial a certain surfactant can be to the desired functionalization.
Keywords:functionalization  layered compounds  nanostructures  surfactants  transition-metal dichalcogenides
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