不锈钢管道低温溅射镀TiN薄膜技术

 设计了一套适用于加速器细长管道真空室的低温溅射镀TiN薄膜装置。利用该装置，对86 mm×2 000 mm的不锈钢管道真空室进行溅射镀TiN膜实验，并对镀膜实验结果进行分析，得到了适用于加速器管道真空室内壁溅射镀TiN膜的表面处理参数。样品测试结果表明：在压强为80～90 Pa、基体温度为160~180 ℃的镀膜参数下，不锈钢管道内壁获得的TiN薄膜最佳，薄膜沉积速率为0.145 nm/s。镀膜后真空室的二次电子产额明显降低。

Technology of coating TiN film on inner face of stainless steel pipe by sputtering at low temperature

A surface treatment setup of coating TiN film on the inner face of stainless steel pipe vacuum chamber for accelerators at low temperature is described. A series of surface treatment parameters have been achieved through many coating experiments on a stainless steel pipe which is 86 mm in diameter and 2 000 mm in length. The test results show that TiN film of the best quality could be coated on the inner face of stainless steel pipe under 80～90 Pa and 160~180 ℃, and the deposition rate achieves 0.145 nm/s. The secondary electron yield of the coated chamber decreases distinctly compared with that of the uncoated chamber.