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Computer study of boron and phosphorus at the Si(100)̶2 ╳ 1 surface
Authors:V.G. Zavodinsky  I.A. Kuyanov  E.N. Chukurov
Affiliation:(1) Institute for Automation, Far Eastern Branch of the Russian Academy of Sciences, 5 Radio, 690041, Vladivostok, Russia, RU
Abstract:The AM1 semiempirical numerical method combined with the geometry optimization procedure was used to study the energetics of active impurities (B, P) in substitutional positions at the Si(100)- surface. It has been found that phosphorus prefers to be in the first layer (in dimers). Boron has the lowest energy in the second layer. Energy profits, counting from the fourth bulk-like layer, for B and P are 1.33 eV and 0.56 eV, respectively. Comparing of the P-Si and P-P dimers energetics has shown that P-Si dimers are more preferable energetically. Received: 26 March 1998 / Accepted: 9 June 1998
Keywords:PACS. 82.20.Wt Computational modeling   simulation
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