NO adsorption on the Rh(110) surface: kinetics and composition of the adlayer studied by fast XPS

The adsorption and dissociation of NO on the Rh(110) surface were studied by synchrotron radiation X-ray photoemission spectroscopy at temperatures in the range 210–370 K. The O 1s or N 1s spectra were collected every 14 s while the surface was continuously exposed to a steady NO gas pressure. The difference in the binding energies for the atomic oxygen (O 1s ≤530.2 eV), atomic nitrogen (N 1s 397.2 eV) and molecular upright bonded NO molecules (O 1s ≥531.0 eV and N 1s 400 eV) allowed us to distinguish these surface species and to follow the evolution of the adsorbate layer. In addition to these dominating surface species a new species, characterized by O 1s binding energy of 530.7 eV and N 1s binding energy similar to that of the atomic nitrogen, was detected within a narrow coverage range. This state is tentatively assigned to a “lying down” NO bonding configuration, detectable at the timescale of the measurements. The uptake plots, constructed using the integrated intensity of the deconvoluted O 1s and N 1s spectra, are used to elucidate the effect of the reaction temperature and surface coverage and composition on the kinetics of dissociative and molecular NO adsorption of Rh(110).