| Effect of Gas Pressure on Nanocrystalline Diamond Films Prepared by Electron-Assisted Chemical Vapour Deposition |
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| 作者姓名： | 吴南春 夏义本 谭寿洪 王林军 |
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| 作者单位： | [1]School of Materials Science and Engineering, Shanghai University, Shanghai 200072 [2]Shanghai Institute of Ceramics, Chinese Academy of Sciences, Shanghai 200050 |
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| 基金项目： | Supported by the National Natural Science Foundation of China under Grant No 60277024, the Nano-technology projects of Shanghai under Grant No 0452 nm051, the Shanghai Foundation of Applied Materials Research and Development under Grant No 0404, and the KeySubject Construction Project （Material Science） of Shanghai Educational Committee. |
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| 摘 要： | With use of electron-assisted chemical vapour deposition （EACVD） technology, nanocrystalline diamond films are successfully deposited on an α-SiC single phase ceramics substrate by means of reduction of the reactive gas pressure. The structure and surface morphology of the deposited films are characterized by Raman spectroscopy, x-ray diffraction （XRD）, field emission scanning electron microscopy （FE-SEM） and atomic force microscopy （AFM）. The results examined by FE-SEM and AFM show that when the gas pressure was reduced to 0.5- 1 kPa, the surface grain size and surface roughness of the diamond film are decreased greatly to 18-32nm and 34-58nm respectively. The grain sizes estimated from full with at half maximum of （111） XRD peak by the Scherrer formula are 6-28 nm. However, too high secondary nucleation rate may result in pores and defects in the deposited films. Only at suitable gas pressure （1 kPa） to deposit films can we obtain densification and better quality nanocrystalline films.
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| 关 键 词： | 化学蒸汽沉积 电子援助 纳米晶体结构 薄膜 光谱学 X射线衍射 |
| 收稿时间： | 2005-06-22 |
| 修稿时间： | 2005-06-22 |
Effect of Gas Pressure on Nanocrystalline Diamond Films Prepared by Electron-Assisted Chemical Vapour Deposition |
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| WU Nan-Chun, XIA Yi-Ben, TAN Shou-Hong, WANG Lin-Jun.Effect of Gas Pressure on Nanocrystalline Diamond Films Prepared by Electron-Assisted Chemical Vapour Deposition[J].Chinese Physics Letters,2005,22(11):2969-2972. |
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| Authors: | WU Nan-Chun XIA Yi-Ben TAN Shou-Hong WANG Lin-Jun |
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