| 射频磁控溅射法制备Zn1-xMgxO薄膜及其性能的研究 |
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| 引用本文： | 王彦利,杨元政,高振杰,谢致薇,陈先朝,何玉定.射频磁控溅射法制备Zn1-xMgxO薄膜及其性能的研究[J].人工晶体学报,2011,40(5):1261-1265. |
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| 作者姓名： | 王彦利 杨元政 高振杰 谢致薇 陈先朝 何玉定 |
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| 作者单位： | 广东工业大学材料与能源学院,广州,510006 |
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| 基金项目： | 国家自然科学基金(50771037); 高等学校博士学科点专项研究基金(200805620004)资助项目 |
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| 摘 要： | 本文通过在ZnO靶材上放置高纯Mg片,运用射频磁控溅射法在普通玻璃衬底上制备了Zn1-xMgxO(x=0.1,0.16,0.18,0.24)薄膜.用X射线衍射仪、扫描电镜、紫外-可见-分光光度计等研究了Zn1-xMgxO薄膜的组织结构和性能.结果表明:Zn1-xMgxO薄膜呈ZnO的纤锌矿结构,在ZnO晶格中Mg2+有效地替代了Zn2+.样品表面比较平整,颗粒均匀致密,薄膜质量较高,且在可见光范围内光透过率均为90;左右,具有极好的透光性；此外,随着Mg掺入量的增多,Zn1-xMgxO薄膜的吸收边出现蓝移现象,实现了对禁带宽度的调节.
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| 关 键 词： | 射频磁控溅射 Zn1-xMgxO薄膜 禁带宽度 |
Preparation and Properties of Zn_(1-x)Mg_xO Thin Films by Radio Frequency Magnetron Sputtering Method |
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| WANG Yan-li
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YANG Yuan-zheng
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GAO Zhen-jie
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XIE Zhi-wei
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CHEN Xian-chao
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HE Yu-ding.Preparation and Properties of Zn_(1-x)Mg_xO Thin Films by Radio Frequency Magnetron Sputtering Method[J].Journal of Synthetic Crystals,2011,40(5):1261-1265. |
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| Authors: | WANG Yan-li YANG Yuan-zheng GAO Zhen-jie XIE Zhi-wei CHEN Xian-chao HE Yu-ding |
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| Institution: | WANG Yan-li,YANG Yuan-zheng,GAO Zhen-jie,XIE Zhi-wei,CHEN Xian-chao,HE Yu-ding (Faculty of Material and Energy,Guangdong University of Technology,Guangzhou 510006,China) |
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| Abstract: | Zn1-xMgxO(x=0.1,0.16,0.18,0.24) thin films were deposited on common glass substrates by RF magnetron sputtering technology with ZnO target which was placed on high-purity Mg thin pieces.The structure,surface morphology and optical properties of the films were characterized by XRD,SEM and transmittance measurements.It was found that all the Zn1-xMgxO films showed ZnO wurtzite structure,which indicated that the Zn2+ were successfully substituted by Mg2+ in the ZnO lattice.The surface of samples was smooth,and... |
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| Keywords: | RF magnetron sputtering Zn1-xMgxO thin films band gap |
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