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功率密度对中频磁控溅射制备 AZO薄膜性能的影向
引用本文:张承庆,胡小萍,朱景森,方玲,李德仁,卢志超,周少雄.功率密度对中频磁控溅射制备 AZO薄膜性能的影向[J].光谱实验室,2011,28(4):1629-1634.
作者姓名:张承庆  胡小萍  朱景森  方玲  李德仁  卢志超  周少雄
作者单位:中国钢研科技集团有限公司 安泰科技股份有限公司 北京市海淀区学院南路76号100081
基金项目:北京市自然科学基金资助项目
摘    要:利用中频磁控溅射法在普通玻璃衬底上沉积掺铝氧化锌(ZnO ∶ Al,简称AZO)薄膜,通过调整溅射功率密度参数得到沉积速率与功率密度之间的关系,制备了不同厚度的AZO薄膜.利用台阶仪、XRD、XPS、紫外可见分光光度计和Hall测试系统等方法研究了功率密度与厚度对AZO薄膜结构、组分、光学和电学性能的影响.实验结果表明...

关 键 词:功率密度  掺铝氧化锌薄膜  中频磁控溅射  X射线光电子能谱法

Effects of Power Density on the Properties of AZO Films Prepared by MF Magnetron Sputtering
ZHANG Cheng-Qing,HU Xiao-Ping,ZHU Jing-Sen,FANG Ling,LI De-Ren,LU Zhi-Chao,ZHOU Shao-Xiong.Effects of Power Density on the Properties of AZO Films Prepared by MF Magnetron Sputtering[J].Chinese Journal of Spectroscopy Laboratory,2011,28(4):1629-1634.
Authors:ZHANG Cheng-Qing  HU Xiao-Ping  ZHU Jing-Sen  FANG Ling  LI De-Ren  LU Zhi-Chao  ZHOU Shao-Xiong
Institution:ZHANG Cheng-Qing HU Xiao-Ping ZHU Jing-Sen FANG LingLI De-Ren LU Zhi-Chao ZHOU Shao-Xiong(Advanced Technology & Materials Co.Ltd.,China Iron and Steel Research Institute Group,Beijing 100081,P.R.China)
Abstract:The aluminum-doped zinc oxide films were prepared by MF magnetron sputtering on glass substrates.The relationship between power density and sedimentation velocity was obtained by adjusting the power density parameter of sputtering,and the different thickness AZO films were prepared.The effects of sputtering power density and films thickness on the structural,components,electrical and optical properties of the AZO films were investigated by step tester,X-ray diffraction,XPS,UV-Vis spectrophotometer and Hall measurement system.The AZO films with thickness of 739nm prepared under the power density of 4W/cm^2 exhibited better performance,of which the resistivity was 1.136×10^-3Ω·cm,and the average transmittance in the visible range was 90.5%.The good performance on the optical and electrical properties of AZO films could be attributed to the good crystalline quality.
Keywords:Power Density  AZO Films  MF Magnetron Sputtering  XPS
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