Oxidation of organic films by beams of hydroxyl radicals |
| |
| Authors: | D'Andrea Timothy M Zhang Xu Jochnowitz Evan B Lindeman T G Simpson C J S M David Donald E Curtiss Thomas J Morris John R Ellison G Barney |
| |
| Institution: | Department of Chemistry & Biochemistry, University of Colorado, Boulder, Colorado 80309-0215, USA. |
| |
| Abstract: | We have studied the oxidation of self-assembled monolayers (SAMs) of alkanes and alkenes with a thermal beam of OH radicals. The target films were produced by bonding alkane thiols and alkene thiols to a gold surface and the SAMs are mounted in a vacuum chamber at a base pressure of 10-9 Torr. Hydroxyl radicals were produced by a corona discharge in an Ar/H2O2/water mixture. The resultant molecular beam was scanned by an electrostatic hexapole and the OH radicals 4 (+/- 1) x 1011 OH radicals cm-2 sec-1] were focused onto the target SAM. All of the hydroxyl radicals impinging on the SAM surface are rotationally (J' '
|
| |
| Keywords: | |
| 本文献已被 PubMed 等数据库收录！ |
|
