Institution: | aKagami Memorial Laboratory for Materials Science and Technology, Waseda University, 2-8-26 Nishiwaseda, Shinjuku, Tokyo 169-0051, Japan bKoha Co., Ltd., 2-6-8 Kouyama, Nerima-ku, Tokyo 176-0022, Japan |
Abstract: | The potential use of β-Ga2O3 wafers as transparent conductive substrates for compounds with hexagonal structure, in particular the GaN-system, is shown. Nitridation of the main cleavage plane under high temperature and NH3 gas results in the substitution of O by N on the surface, and a simultaneous surface reconstruction. The 2-fold symmetry of the initial (1 0 0) plane changes to a 6-fold symmetry, keeping the 0 1 0] azimuth as a symmetry direction. The RHEED pattern suggests the formation of GaN on the β-Ga2O3 surface, with the b-axis of β-Ga2O3 parallel to the direction of GaN, so that β-Ga2O3 can be used as a substrate with no lattice mismatch to GaN. |