| Cr,Fe,Cu/Al2O3界面化学结构的光电子能谱 |
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| 引用本文： | 任海兰,刘韩星,张汉林,欧阳世翕,王典芬.Cr,Fe,Cu/Al2O3界面化学结构的光电子能谱[J].物理化学学报,1996,12(10):900-904. |
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| 作者姓名： | 任海兰 刘韩星 张汉林 欧阳世翕 王典芬 |
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| 作者单位： | Adveanced Materials Research Institute,Wuhan University of Technology,Wuhan 430070,The Center for Materials Research and Analysis,Wuhan University of Technology,Wuhan 430070 |
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| 基金项目： | 国家自然科学基金，国家高技术基金 |
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| 摘 要： | 应用Ｘ－射线光电子能谱，通过离子刻蚀，原位研究第四周期过渡金属与氧化铝所形成界面的化学状态，结果表明，Ｃｒ，Ｆｅ在界面处有不同程度的氧化，氧化程度Ｃｒ＞Ｆｅ，而Ｃｕ则无明显氧化。化学成份的定量分析表明，界面过渡层的厚度与界面化学反应强弱直接相关。
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| 关 键 词： | 金属-陶瓷界面 光电子能谱 化学结构 |
| 收稿时间： | 1996-03-19 |
| 修稿时间： | 1996-06-10 |
The Chemical Structure of Cr,Fe,Cu/Al_2O_3 Interface by XPS |
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| Ren Hailan , Liu Hanxing, Zhang Hanlin, Ouyang Shixi.The Chemical Structure of Cr,Fe,Cu/Al_2O_3 Interface by XPS[J].Acta Physico-Chimica Sinica,1996,12(10):900-904. |
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| Authors: | Ren Hailan Liu Hanxing Zhang Hanlin Ouyang Shixi |
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| Institution: | Adveanced Materials Research Institute,Wuhan University of Technology,Wuhan 430070|The Center for Materials Research and Analysis,Wuhan University of Technology,Wuhan 430070 |
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| Abstract: | The chemical states of metal-ceramic interface were studied by XPS accompany the ion etching in situ. The results showed that Cr and Fe were both oxidized at the interfaces, and the degree of the oxidization was Cr>Fe, while Cu was not oxidized.The quantity analysis showed that the thickness of the interfaces had a direct relations with the chemical reaction. |
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| Keywords: | Metal-ceramic interface XPS Chemical structure |
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