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| TFEL器件发光层的电场随外电压的变化 | |
| 引用本文： | 滕枫 娄志东. TFEL器件发光层的电场随外电压的变化[J]. 发光学报, 1996, 17(4): 337-340 |
| 作者姓名： | 滕枫 娄志东 |
| 作者单位： | 1. 天津理工学院材料物理所, 天津 300191;2. 中国科学院激发态物理开放研究实验室, 长春 130021;3. 南开大学物理系, 天津 300071 |
| 基金项目： | 国家自然科学基金资助项目 |
| 摘 要： | 本文利用弗朗兹-凯尔迪效应研究了TFEL器件发光层中的电场随外加电压的变化。用此方法算得的发光层中的电场同把器件各层当作只起绝缘作用的电介质时算得的电场强度,虽然数量级相同,但数值上有差别,特别当外加电压达到发光阈值电压时,差别更为明显。 |
| 关 键 词： | 电致发光 弗朗兹-凯尔迪效应 |
| 收稿时间： | 1995-11-30 |
THE DEPENDENCE OF FIELD ON APPLIED VOLTAGE IN TFEL DEVICE |
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| Teng Feng Lou Zhidong Xu Zheng Hou Yanbing. THE DEPENDENCE OF FIELD ON APPLIED VOLTAGE IN TFEL DEVICE[J]. Chinese Journal of Luminescence, 1996, 17(4): 337-340 | |
| Authors: | Teng Feng Lou Zhidong Xu Zheng Hou Yanbing |
| Affiliation: | 1. Institute of Material Physics, Tianjin Institute of Technology, Tianjin 300191; 2. Laboratory of Excited State Processes, Chinese Academy of Sciences, Changchun 130021;3. Department of Physics, Nankai University, Tianjin 300071 |
| Abstract: | In this paper, The field in the phosphor of a TFEL device vs. applied voltage characteristic is investigated by Franz-Keldysh effect. The field strength in the phosphor calculated using this method has difference in numerical value compared with that estimated by the methods of every layer only acting as insulating layer though they are in the same order. The difference is even bigger at the threshold voltage. |
| Keywords: | electroluminescence Franz-Keldysh effect |
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