| 一种紫外或深紫外光刻的1：1折反射式光学系统 |
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| 引用本文： | 鄢雨,邹海兴.一种紫外或深紫外光刻的1：1折反射式光学系统[J].光学学报,1993,13(10):40-943. |
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| 作者姓名： | 鄢雨 邹海兴 |
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| 作者单位： | 中国科学院上海光学精密机械研究所 上海201800
(鄢雨，邹海兴)，中国科学院上海光学精密机械研究所 上海201800(王之江) |
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| 摘 要： | 设计了一种新的紫外或深紫外光刻物镜。该物镜与国内外现有的紫外或深紫外光刻物镜相比，既能满足大数值孔径的需要，又能充分利用物镜的视场。采用环形照明，能缓解因增大数值孔径而使焦深缩短的矛盾。
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| 关 键 词： | 光刻 光学系统 数值孔径 紫外辐射 |
| 收稿时间： | 1992/10/16 |
1 : 1 optics for UV or DUV lithography |
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| YAN Yu ZOU Haixing WANG Zhijiang.1 : 1 optics for UV or DUV lithography[J].Acta Optica Sinica,1993,13(10):40-943. |
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| Authors: | YAN Yu ZOU Haixing WANG Zhijiang |
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| Abstract: | The design of a new kind of UV or DUV lithography lenses is described in this paper. Compared with other UV or DUV lithography lenses, this lens can meet the needs of higher numerical aperture and full use of its field. Using the ring illumination, this lens can provide a solution for the contradiction of shortening DOF while enlarging NA. |
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| Keywords: | UV or DUV lithography aberration balance MTF obscuration ratio |
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