Analysis of the antitarnish film on a tin surface by x-ray photoelectron spectroscopy and Auger electron spectroscopy |
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Authors: | Wang Zhanwen Wu Naijun Fang Jingli |
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Affiliation: | Department of Applied Chemistry, Nanjing Institute of Chemical Technology, Nanjing 210009 China;Department of Chemistry, Nanjing University, Nanjing 210008 China |
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Abstract: | A corrosion-resistant complex film formed in ethylenediaminetetra(methylidenephosphonic acid) (EDTMP) solution was determined by x-ray photoelectron spectroscopy and Auger electron spectroscopy to consist of 48.0% O, 11.7% Sn, 7.7% N, 22.1% C and 10.5% P. From the differences in the binding energies of Sn, N and O before and after film formation and the RPO2?3 and SnN vibrations in the Raman spectrum of the film, it was deduced that N and O in EDTMP were coordinated with Sn in the film. |
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Keywords: | X-ray photoelectron spectroscopy Auger electron spectroscopy Tin Antitarnish film |
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