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Analysis of the antitarnish film on a tin surface by x-ray photoelectron spectroscopy and Auger electron spectroscopy
Authors:Wang Zhanwen  Wu Naijun  Fang Jingli
Affiliation:Department of Applied Chemistry, Nanjing Institute of Chemical Technology, Nanjing 210009 China;Department of Chemistry, Nanjing University, Nanjing 210008 China
Abstract:
A corrosion-resistant complex film formed in ethylenediaminetetra(methylidenephosphonic acid) (EDTMP) solution was determined by x-ray photoelectron spectroscopy and Auger electron spectroscopy to consist of 48.0% O, 11.7% Sn, 7.7% N, 22.1% C and 10.5% P. From the differences in the binding energies of Sn, N and O before and after film formation and the RPO2?3 and SnN vibrations in the Raman spectrum of the film, it was deduced that N and O in EDTMP were coordinated with Sn in the film.
Keywords:X-ray photoelectron spectroscopy  Auger electron spectroscopy  Tin  Antitarnish film
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