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Laser processing for deposition of high Tc superconducting films
Authors:A Richter and G Kessler
Institution:

Zentralinstitut für Festkörperphysik und Werkstofforschung der Akademie der Wissenschaften der DDR, Helmholtzstr. 20, Dresden 8027, G.D.R.

Abstract:Model considerations are applied to investigate the process of pulsed laser deposition of high Tc superconducting films. At low power densities, heat conduction and evaporation above a thermal threshold energy dominate. Increase of the laser flux results in the generation of a dense plasma with a mass ablation flow away from the target. According to different wave lengths the relation of the energy density to the pulse duration is estimated. Very short light pulses above a threshold energy density favour the ablation of a stoichiometric mass flow from a multicomponent target and suppress evaporation according to different vapor pressures.
Keywords:
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