| 高损伤阈值三倍频分离膜 |
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| 引用本文： | 王孝东,张锦龙,马彬,焦宏飞,丁涛,程鑫彬.高损伤阈值三倍频分离膜[J].强激光与粒子束,2011,23(7). |
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| 作者姓名： | 王孝东 张锦龙 马彬 焦宏飞 丁涛 程鑫彬 |
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| 作者单位： | 1. 同济大学 精密光学工程技术研究所， 上海 200092; 2. 上海市特殊人工微结构材料与技术重点实验室， 上海 200092; 3. 同济大学 航空航天与力学学院， 上海 200092 |
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| 基金项目： | 国家高技术发展计划项目，中国博士后科学基金，上海市博士后基金 |
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| 摘 要： | 设计了Nd：YAG激光用三倍频分离膜，膜层材料为SiO2和HfO2。经过优化，膜系在355 nm处的反射率在99%以上，在532 nm和1 064 nm处透射率也在99%以上。采用电子束蒸发技术，在熔融石英基底上制备了样品,经测量，制备的分离膜光学性能与设计值接近。分离膜在355 nm激光辐照下的损伤阈值为5.1 J/cm2，并用微分干涉显微镜表征了薄膜损伤形貌。
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| 关 键 词： | 三倍频分离膜 电子束蒸发 激光损伤阈值 光学薄膜 |
| 收稿时间： | 1900-01-01; |
Third harmonic separator with high laser-induced damage threshold |
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| Wang Xiaodong,Zhang Jinlong,Ma Bin,Jiao Hongfei,Ding Tao,Cheng Xinbin.Third harmonic separator with high laser-induced damage threshold[J].High Power Laser and Particle Beams,2011,23(7). |
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| Authors: | Wang Xiaodong Zhang Jinlong Ma Bin Jiao Hongfei Ding Tao Cheng Xinbin |
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| Institution: | (1. Institute of Precision Optical Engineering, Tongji University, Shanghai 200092, China; 2. Shanghai Key Laboratory of Special Artificial Microstructure Materials and Technology, Shanghai 200092, China； 3. School of Aerospace Engineering and Applied Mechanics, Tongji University, Shanghai 200092, China） |
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| Abstract: | Using electron beam evaporation, a 355 nm separator was designed by depositiing SiO2 and HfO2 alternatively. The coating has a reflectivity of larger than 99% at 355 nm through optimization and a transmittance larger than 99% at 532 nm and 1 064 nm. It has good electric-field distribution. The spectra of the fabricated coating is close to the designed one. The laser-induced damage threshold of the coating is 5.1 J/cm2. Morphology of laser-induced damage of the coating was characterized by differential interference contrast microscope． |
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| Keywords: | electron beam evaporation laser-induced damaged threshold thin film |
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