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Pt基电极材料硫中毒机理的计算机模拟研究
引用本文:沈凯,张岩星,王金龙,路战胜,杨宗献.Pt基电极材料硫中毒机理的计算机模拟研究[J].原子与分子物理学报,2011,28(1):156-160.
作者姓名:沈凯  张岩星  王金龙  路战胜  杨宗献
作者单位:河南师范大学物理与信息工程学院,新乡,453007
摘    要:采用基于密度泛函理论的第一性原理方法和超原胞模型,计算并分析了Pt及Cu掺杂的Pt基合金的表面态密度,以及S在Pt及Pt基合金表面的吸附能和态密度情况.考虑了多种掺杂体系及吸附构型,结果表明:Cu掺杂会降低Pt基体系表面费米能级附近态密度,Pt皮肤的存在可以有效地减小Cu掺杂对体系表面态密度的影响;与S在纯Pt表面吸附相比较,S在掺杂体系表面的吸附能较小,且S的吸附对掺杂体系费米能级附近表面态密度影响较小. 以上研究结果有助于为改善Pt基电极材料的催化性能,尤其是其抗S中毒性能提供理论依据.

关 键 词:Pt    Cu    S中毒    掺杂    密度泛函理论
收稿时间:5/9/2010 12:00:00 AM

A first principles study on the mechanism of sulfur poisoning for Pt-based electrode materials
SHEN Kai,ZHANG Yan-Xing,and YANG Zong-Xian.A first principles study on the mechanism of sulfur poisoning for Pt-based electrode materials[J].Journal of Atomic and Molecular Physics,2011,28(1):156-160.
Authors:SHEN Kai  ZHANG Yan-Xing  and YANG Zong-Xian
Institution:Henan Normal University
Abstract:The electronic and energetic properties of the pristine and S adsorbed Pt and Cu-doping Pt surfaces are presented by first principles method. It is found that: the peak of the density of states near to the Fermi level would be lowered by the Cu dopant, while the Pt-skin would reduce the influence of the Cu dopant on the density of states. Comparing with the undoped system, the Cu dopant will reduce the interaction between the S and Pt surface and the peak of the density of states near to the Fermi level is much less influenced by the S adsorption. The results can theoretically help to improve the catalytic properties and explain the mechanism of sulfur poisoning for Pt-based electrode materials.
Keywords:Pt  Cu  S poisoning  doping  DFT
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