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Coverage-dependent chemisorption of Cl on Si(1 1 4)
Authors:R.E. Butera  Abhishek Agrawal  J.H. Weaver
Affiliation:Department of Materials Science and Engineering, University of Illinois at Urbana-Champaign, Urbana, IL 61801, United States
Abstract:The dissociative chemisorption of Cl2 on Si(1 1 4) was studied at room temperature using scanning tunneling microscopy. Filled and empty state imaging revealed a multitude of possible adsorption configurations with adsorption preferring rebonded atom and dimer sites over tetramer sites. The dissociation and subsequent adsorption processes were sufficiently exothermic that Cl could interrogate the potential energy landscape and find local energy minima. Annealing revealed configurations that preserved the strongest π-bonds of the (1 1 4) reconstruction.
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