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AlGaN/GaN 高速电子迁移率晶体管器件电流坍塌效应与界面热阻和温度的研究
引用本文:顾江,王强,鲁宏.AlGaN/GaN 高速电子迁移率晶体管器件电流坍塌效应与界面热阻和温度的研究[J].物理学报,2011,60(7):77107-077107.
作者姓名:顾江  王强  鲁宏
作者单位:(1)常熟理工学院物理电子系,常熟 215500; (2)南通大学电子信息学院,南通 226019
摘    要:本文系统研究了AlGaN/GaN基高速电子迁移率晶体管器件界面热阻和工作温度对器件在高功率下的电流坍塌效应的影响规律.研究发现低漏极电压下热电子是导致负微分输出电导的重要因素,器件工作温度变高会使负微分输出电导减小.高漏极电压下自加热效应是导致电流坍塌的一个重要因素.随着界面热阻的增加,器件跨导降低,阈值电压增大.同时,由于工作环境温度的增高,器件随之温度增高,载流子迁移率会显著降低. 最终这两种因素会引起AlGaN/GaN基高速电子迁移率晶体管器件显著的电流坍塌效应,从而降低了器件整体性能. 关键词: AlGaN/GaN HEMT 器件 热电子效应 自加热效应 电流坍塌效应

关 键 词:AlGaN/GaN  HEMT  器件  热电子效应  自加热效应  电流坍塌效应
收稿时间:2010-10-07

Current collapse effect, interfacial thermal resistance and work temperature for AlGaN/GaN HEMTs
Gu Jiang,Wang Qiang and Lu Hong.Current collapse effect, interfacial thermal resistance and work temperature for AlGaN/GaN HEMTs[J].Acta Physica Sinica,2011,60(7):77107-077107.
Authors:Gu Jiang  Wang Qiang and Lu Hong
Institution:Department of Physics and Electronic, Changshu Institute of Technology, Changshu 215500, China;School of Electronics and Information, Nantong University, Nantong 226019, China;Department of Physics and Electronic, Changshu Institute of Technology, Changshu 215500, China
Abstract:The effects of operating temperature and the interfacial thermal resistance on device are researched by using a two-dimensional numerical simulator. A comparison between the simulated results and the experiment data demonstrates that hot electrons make a significant contribution to the negative differential output conductance which will increase with the increase of the work temperature under low drain voltage, and under upper drain voltage, the self-heating effect is an important factor to the current collapse which will become more serious with the work temperature and interfacial thermal resistance inereasing.
Keywords:AlGaN/GaN HEMT devices  hot electron effect  self-heating effect  current collapse effect
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