Combinatorial thin film synthesis of Gd-doped Y3Al5O12 ultraviolet emitting materials |
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Authors: | Y Deng JD Fowlkes JM Fitz-Gerald PD Rack |
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Institution: | (1) Dept. of Materials Science and Engineering, The University of Tennessee, Knoxville, TN 37996-2200, USA;(2) Dept. of Materials Science and Engineering, The University of Virginia, Charlottesville, VA 22904-4745, USA |
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Abstract: | Multi-layer Y3Al5O12:Gd thin films were deposited in a combinatorial fashion using radio-frequency magnetron sputtering. Initially, Y3Al5O12 (yttrium aluminum garnet or YAG) films were deposited in a combinatorial fashion to optimize the Y and Al sputtering conditions. Subsequently, alternating layers of uniform Y3Al5O12 and graded Gd were deposited and the film composition was homogenized by post-deposition 1000 °C 10-h thermal treatment. A composition range of 1–12 at% Gd was produced in two films. Ultraviolet emission with a peak wavelength at 312 nm was observed from the gadolinium 8S7/2-6P7/2 transition via cathodoluminescence (CL) excitation. The CL-induced intensity was found to be maximum at 5.5 at% Gd. PACS 81.15.Cd, 78.60.Hf, 02.10.Ox, 78.66.-w, 81.15.-z, 78.67.Pt |
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