|
|||||
|
|
| A Study of Microstructures in Helium-implanted 4H-SiC by RBS-channeling and TEM | |
| 作者姓名： | ZhangChonghong SunYoumei SongYing DuanJinglai T.Shibayama K.Sakaguchi H.Takahashi ShenDingyu |
| 作者单位： | [1]不详 [2]LaboratoryforUltra-functlonalMaterials,CenterforAdvancedResearchofEnergyTechnology,HokkaidoUniversity,Sapporo,Japan. [3]MOEKeyLaboratoryofHeavyIonPhysics,PekingUniversity,Beijing. |
| 摘 要： | |
| 关 键 词： | 氦离子注入 碳化硅晶体 显微结构 RBS沟道 透射电镜研究 TEM 串联加速器 |
| 本文献已被 维普 等数据库收录！ | |