| 电感耦合等离子体质谱法测定高纯金中痕量杂质 |
| |
| 引用本文： | 刘湘生,张安定,刘玉龙,鲁毅强. 电感耦合等离子体质谱法测定高纯金中痕量杂质[J]. 分析化学, 2000, 10(3): 322-325 |
| |
| 作者姓名： | 刘湘生 张安定 刘玉龙 鲁毅强 |
| |
| 作者单位： | 北京有色金属研究总院!北京,100088,北京科技大学,北京有色金属研究总院!北京,100088,北京科技大学 |
| |
| 摘 要： | 建立了高纯金中40余种痕量杂质的电感耦合等离子体质谱测定方法。方法检出限为0．0006～0．21μg/L。考察了基体Au的谱干扰及基体效应,采用Cs内标补偿基体对待测信号的抑制作用。方法简单、快速、灵敏、准确。
|
| 关 键 词： | 高纯金 痕量杂质 内标 铯 ICP－MS法 |
Determination of High Purity Gold by Inductively Coupled Plasma-Mass Spectrometry |
| |
| Liu Xiangsheng, Zhang Anding, Liu Yulong, Lu Yiqiang. Determination of High Purity Gold by Inductively Coupled Plasma-Mass Spectrometry[J]. Chinese Journal of Analytical Chemistry, 2000, 10(3): 322-325 |
| |
| Authors: | Liu Xiangsheng Zhang Anding Liu Yulong Lu Yiqiang |
| |
| Abstract: | Themethod of inductively coupled plasma-mass spectrometry for the deermination of impuritiesof 44 trace elements in highly pure gold was studied. The determination limit is 0.0006～0.21 μg/L. The spectralinterference and matrix effect for gold on the method were discussed. The matrixsuppression effect of gold on signal could effectively be eliminated by using Cs asinternal standard. This method is simple, rapid, sensitive and accurate. |
| |
| Keywords: | Inductively coupled plasma-mass spectrometry high purity gold trace impurities internal standard cesium |
| 本文献已被 CNKI 维普 万方数据 等数据库收录！ |
|
