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Reduction of Ordering Temperature of FePt-Al2O3 Thin Films by N2 Addition During Sputtering
作者姓名:曹江伟  N.Katayama  杨正  魏福林  M.Matsumoto  A.Morisako  刘小晰  S.Takei
作者单位:[1]Research Institute of Magnetic Materials, Lanzhou University, Lanzhou 730000 [2]Department of Information Engineering, Shinshu University, 4-17-I Wakasato, Nagano 380-8553, Japan
摘    要:We investigate the effect of N2 addition during sputtering on the microstructure and magnetic properties of FePt-Al2O3 thin films. The texture of FePt phase in FePt-Al2O3 thin films changes from (111) to a more random orientation by N2 addition during sputtering. The ordering temperature of FePt phase reduces about 100℃ with appropriate N2 partial pressure. A larger coercivity of 6.0 × 10^5 Aim is obtained with N2 partial pressure about 15%. Structural analysis reveals that a small quantity of Fe3N phase forms during sputtering and the release of N atoms during the post annealing induces a large number of vacancies in the films, which benefits to the transformation of FePt phase from fcc to fct.

关 键 词:薄膜  电子喷射  微观结构  磁性质  三氧化二铝
收稿时间:2005-07-03
修稿时间:2005-07-03

Reduction of Ordering Temperature of FePt-Al2O3 Thin Films by N2 Addition During Sputtering
CAO Jiang-Wei, N. Katayama, YANG Zheng, WEI Fu-Lin, M. Matsumoto, A. Morisako, LIU Xiao-Xi, S. Takei.Reduction of Ordering Temperature of FePt-Al2O3 Thin Films by N2 Addition During Sputtering[J].Chinese Physics Letters,2005,22(11):2899-2902.
Authors:CAO Jiang-Wei  N Katayama  YANG Zheng  WEI Fu-Lin  M Matsumoto  A Morisako  LIU Xiao-Xi  S Takei
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