杂质元素特征X射线对氢气放电源打靶新谱线的影响

 在氢气放电源打靶的实验中，测到了系列能量恒定不变的低能X射线新谱线，这些新谱线的能量分别为(1.70±0.10) keV, (2.25±0.07) keV,(2.56±0.08) keV,(3.25±0.10) keV和（3.62±0.11） keV，与Si,Ta,S,Cl,K和Ca等元素的特征X射线能量相近，但靶中所含的杂质或来自放电室的杂质元素可能会产生这些能量的X射线谱峰，证实新谱线是否由这些元素的特征X射线干扰所致显得尤为重要。分析了本实验系统中各种杂质的可能来源，论证了放电室端杂质对新谱线的影响，及靶材料中体杂质和面杂质对新谱线的影响；用X射线光电子能谱仪对靶做了表面分析。研究结果表明：杂质元素的特征X射线不会对氢气放电源打靶产生的新谱线有影响。这些新谱线的性质有待进一步的实验研究。

Influence of characteristic X-ray of impurity element on anonymous spectral lines excited by hydrogen gas discharge source bombarding targets

A series of low energy X-ray spectral lines which have constant energy have been detected in hydrogen gas discharge source bombarding targets.Their energy are 1.7 keV,2.3 keV,2.6 keV,3.3 keV and 3.7 keV,respectively.These anonymous spectral lines can not be explained by the known theories.There are still possibilities that they are produced by potential impurity elements in targets or in the discharge chamber,although the energy of the anonymous spectral lines are close to the energy of the characteristic X-ray of some elements,such as Si,Ta,S,Cl,K,Ca and Ti,etc.In this paper,the origin of impurity elements in the experimental system are analyzed,the influence of impurity elements in the discharge chamber and targets on the new spectral lines are studied,and the target surface is analyzed by X-ray photoelectron spectroscopy.The study shows that the impurity elements have no influence on the generation of the anonymous spectral lines.The characteristics of the anonymous spectral lines need further experimental and theoretical study.