| 用于半导体加工的腔耦合－磁多极型ECR源的研究 |
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| 引用本文： | 徐茵,顾彪,丛吉远,季天仁. 用于半导体加工的腔耦合－磁多极型ECR源的研究[J]. 核聚变与等离子体物理, 1996, 0(2) |
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| 作者姓名： | 徐茵 顾彪 丛吉远 季天仁 |
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| 作者单位： | 大连理工大学电磁工程系，电子科技大学高能电子所 |
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| 摘 要： | 本实验室研制出一台谐振腔耦合一多极场位形的电子回旋共振（ＥＣＲ）微波等离子体源（ＭＥＰ）。采用朗谬探针和离子能量分析器，测量了ＭＥＰ中Ａｒ等离子体的放电特性。实验结果表明．ＭＥＰ能在很宽的运行参数范围，高效率地产生具有较高密度、较低离子温度和空间电位的大面积均匀等离子体，特别适合于半导体加工应用研究。
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| 关 键 词： | 腔耦合，多极场，电子回族共振，微波等离子体 |
INVESTIGATION OF A CAVITY COUPLING-MULTIPOLE ECR SOURCE FOR APPLICATION IN SEMICONDUCTOR PROCESSING |
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| XU Yin, GU Biao, CONG Jiyuan. INVESTIGATION OF A CAVITY COUPLING-MULTIPOLE ECR SOURCE FOR APPLICATION IN SEMICONDUCTOR PROCESSING[J]. Nuclear Fusion and Plasma Physics, 1996, 0(2) |
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| Authors: | XU Yin GU Biao CONG Jiyuan |
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| Abstract: | A new kind of ECR (electron cyclotron resonance) microwave plasma source featuring acavity coupling-multipole field configuration (MEP) has been developed. Discharge characteristics of Ar plasma in the MEP were measured with Langmuir probe and ion energy analyzer. It is shown that a large area uniform plasma of high density and low ion temperattlreand plasma potential can be produced with high efficiency by the MEP over a wide range ofoperation parameters and the MEP seems to be applicable to plasma processing of semiconductor. |
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| Keywords: | Cavity coupling Multipole field Electron cyclotron resonance Microwave plasma |
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