Mutual spontaneous and electrosurface processes at heterophase interfaces WO3|Me2(WO4)3 (Me = In,Eu, Sc) |
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Authors: | N. N. Pestereva A. V. Potashnikova K. Yu. Shunyaev A. Ya. Neiman |
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Affiliation: | (1) Ural State University, pr. Lenina 51, Yekaterinburg, 620083, Russia;(2) Instutute of Metallurgy, Ural Division, Russian Academy of Sciences, Yekaterinburg, Russia |
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Abstract: | For the first time ever it is demonstrated in this work that, in spontaneous conditions and following the imposition of an electric field, mutual penetration of components of WO3 and Me2(WO4)3 occurs at heterophase interfaces WO3|Me2(WO4)3 where Me = In, Eu, or Sc. Tungstic oxide WO3 is pulled onto the inner surface of ceramic Me2(WO4)3 and, in turn, components of Me2(WO4)3 penetrate onto the surface of grains of ceramic WO3, which is confirmed by the method of x-ray—fluorescence analysis. Data concerning the conductivity and transport numbers of Eu2(WO4)3 and a composite on its basis, which was manufactured as a result the electrosurface transport of WO3, are obtained for the first time ever. With allowance made for the data on the O2? character of the ionic conduction in MeWO4 and Eu2(WO4)3 it is concluded that the type of ionic carriers in tungstates (Me n+)2/n [WO4] makes no impact on the mechanism of spontaneous and field-induced processes that are developing at the (Me n+)2/n [WO4]|WO3 interfaces. |
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Keywords: | electrosurface transport interfacial processes ionic conduction transport numbers |
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