| 二甲基甲酰胺中电沉积制备钐钴合金 |
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| 引用本文： | 王宇,何凤荣,刘冠昆,童叶翔. 二甲基甲酰胺中电沉积制备钐钴合金[J]. 应用化学, 2002, 19(1): 88-0 |
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| 作者姓名： | 王宇 何凤荣 刘冠昆 童叶翔 |
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| 作者单位： | 中山大学 |
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| 基金项目： | 广东省自然科学基金资助项目 ( 96 0 0 0 2 ) |
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| 摘 要： | 稀土;恒电位电沉积;柠檬酸;二甲基甲酰胺中电沉积制备钐钴合金
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| 关 键 词： | 稀土 恒电位电沉积 柠檬酸 二甲基甲酰胺中电沉积制备钐钴合金 |
| 文章编号： | 1000-0518(2002)01-0088-03 |
| 收稿时间： | 2009-06-29 |
| 修稿时间： | 2001-05-10 |
Preparation of Sm-Co Alloy by Electrodeposition in DMF Solution |
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| WANG Yu,HE Feng-Rong,LIU Guan-Kun ,TONG Ye-Xiang. Preparation of Sm-Co Alloy by Electrodeposition in DMF Solution[J]. Chinese Journal of Applied Chemistry, 2002, 19(1): 88-0 |
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| Authors: | WANG Yu HE Feng-Rong LIU Guan-Kun TONG Ye-Xiang |
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| Affiliation: | WANG Yu,HE Feng-Rong,LIU Guan-Kun *,TONG Ye-Xiang |
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| Abstract: | Electrodeposition of Sm-Co alloy in DMF solution was studied by cyclic voltammetry and potentiostatic deposition at room temperature. The results show that small amount of water in a solution of Sm(NO 3) 3+CoCl 2+DMF blocked the electrodeposition of Sm-Co due to the formation of nonconductive Sm(OH) 3 film on the cathode surface. Citric acid could buffer the pH change and inhibit the precipitation of Sm(OH) 3 on the cathode surface which makes the co-deposition of Sm and Co easy. Potentiostatic deposition was carried out on copper electrode in Sm(NO 3) 3+CoCl 2+Citric acid+DMF solution and Sm-Co alloy films were obtained where the content of Sm could be as high as 57 56%. |
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| Keywords: | Sm-Co alloy potentiostatic deposition citric acid dimethylformamide |
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