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喷嘴-平板直流电晕放电中的OH(A2S+→X2P, 0-0)光谱研究
引用本文:高翔,余权,吴祖良,谭永杰,沈旭,骆仲泱,岑可法. 喷嘴-平板直流电晕放电中的OH(A2S+→X2P, 0-0)光谱研究[J]. 强激光与粒子束, 2007, 19(4)
作者姓名:高翔  余权  吴祖良  谭永杰  沈旭  骆仲泱  岑可法
作者单位:1. 浙江大学 能源清洁利用国家重点实验室, 杭州 310027;2. 浙江工商大学 环境工程系, 杭州 310035
摘    要: 为更深入地认识电晕放电低温等离子体中自由基的生成机理,以发射光谱测量为基础并结合背景气体淬灭率影响,研究了常压下喷嘴-平板电晕自由基簇射过程中放电参数、背景气体、电极气成分等因素对OH(A2S+→X2p, 0-0)发光的影响。结果表明:在放电参数影响中,放电电压及放电电流都会影响OH生成量,OH发光随功率增加而大大增强;在加湿氮气直流电晕放电中有明显的OH(A2S+→X2p, 0-0)光谱存在,但加湿空气条件下OH生成较少;载气增湿后OH生成量明显增多,而Ar和O­2的存在分别增强和减弱了OH(A2S+→X2p, 0-0)发光,可能的原因是这两种物质影响了放电和OH(A2S+)的淬灭。

关 键 词:OH自由基  发射光谱  电晕  自由基  放电  淬灭
收稿时间:1900-01-01;

OH(A2S+→X2P, 0-0) emission spectrum in nozzle-to-plate DC corona discharge
gao xiang,yu quan,wu zu-liang,tan yong-jie,shen xu,luo zhong-yang,cen ke-fa. OH(A2S+→X2P, 0-0) emission spectrum in nozzle-to-plate DC corona discharge[J]. High Power Laser and Particle Beams, 2007, 19(4)
Authors:gao xiang  yu quan  wu zu-liang  tan yong-jie  shen xu  luo zhong-yang  cen ke-fa
Affiliation:1. State Key Laboratory of Clean Energy Utilization, Zhejiang University, Hangzhou 310027, China;2. Department of Environmental Engineering, Zhejiang Gongshang University, Hangzhou 310035, China
Abstract:In order to get extensive knowledge of radical production in a corona induced non-thermal plasma, the effect of discharge parameter, gas condition on emission intensity of OH(A2S+→X2P, 0-0) in a nozzle-to-plate corona radical shower system are experimentally investigated using emission spectroscopy considering the collisional quenching rate. The results are that: both discharge voltage and current have direct influence on OH emission, OH production increases as discharge power rises; remarkable emission spectrum of OH(A2S+→X2P, 0-0) is detected in N2 DC corona discharge, but few OH radicals exist in air discharge; humidification of electrode gas can enhance the OH emission, and the existence of Ar increases the OH emission, while O2 may reduce the OH emission, the possible reason is th
Keywords:Emission spectrum  Corona  Radical  Discharge  Quenching
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