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无序双层六角氮化硼量子薄膜的电子性质
引用本文:肖化平,陈元平,杨凯科,魏晓林,孙立忠,钟建新.无序双层六角氮化硼量子薄膜的电子性质[J].物理学报,2012,61(17):178101-178101.
作者姓名:肖化平  陈元平  杨凯科  魏晓林  孙立忠  钟建新
作者单位:湘潭大学材料与光电物理学院量子工程与微纳能源技术实验室,湘潭,411105
基金项目:国家自然科学基金(批准号: 11074213, 51176161, 51006086, 11074211); 湖南省自然科学基金省市联合项目(批准号: 10JJ9001); 湖南省高校创新平台开放基金项目(批准号: 09K034)和教育部新世纪优秀人才支持计划 (批准号: NCET-10-0169)资助的课题.
摘    要:基于安德森紧束缚模型,本文研究了无序双层六角氮化硼量子薄膜的电子性质. 数值计算结果表明在双层都无序掺杂的情况下,六角氮化硼量子薄膜的电子是局域的, 其表现为绝缘体性质;而对于单层掺杂(无论是氮原子还是硼原子)的双层六角氮化硼量子薄膜, 在能谱的带尾出现了持续的迁移率边.这就说明在单层掺杂的双层六角氮化硼量子薄膜中产生了 金属绝缘体转变.这一结果证实了有序-无序分区掺杂的理论模型,为理解及调控双层六角氮化硼量子薄膜 的电子性质提供了有益的理论指导.

关 键 词:六角氮化硼量子薄膜  电子性质  金属-绝缘体转变
收稿时间:2012-04-07

Electronic properties of disordered bilayer hexagonal boron nitride quantum films
Xiao Hua-Ping,Chen Yuan-Ping,Yang Kai-Ke,Wei Xiao-Lin,Sun Li-Zhong,Zhong Jian-Xin.Electronic properties of disordered bilayer hexagonal boron nitride quantum films[J].Acta Physica Sinica,2012,61(17):178101-178101.
Authors:Xiao Hua-Ping  Chen Yuan-Ping  Yang Kai-Ke  Wei Xiao-Lin  Sun Li-Zhong  Zhong Jian-Xin
Institution:Laboratory for Quantum Engineering and Micro-Nano Energy laboratory, Faculty of Materials, Optoelectronics and Physics, Xiangtan University, Xiangtan 411105, China
Abstract:Based on the Anderson tight-binding model, the electronic properties of disordered bilayer hexagonal boron nitride quantum films are investigated. Our numerical results show that the electrons in a disordered bilayer hexagonal boron nitride quantum film are localized, presenting an insulating property. However, for the monolayer disordered bilayer hexagonal boron nitride quantum film, the energy spectrum has persistent mobility edges which are independent of the disorder strength. This indicates that a metal-insulator transition occurs in the monolayer disorder structure. This is similar to the case in an order-disorder separated quantum film. The results could offer useful information for understanding and manipulating the electronic properties of bilayer hexagonal boron nitride quantum films.
Keywords:bilayer hexagonal boron nitride quantum films  electronic property  metal-insulator transition
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