Integrity of functional self-assembled monolayers on hydrogen-terminated silicon-on-insulator wafers |
| |
Authors: | Fangyuan Tian Andrew V Teplyakov |
| |
Institution: | a Department of Chemistry and Biochemistry, University of Delaware, Newark, DE 19716, USA b Department of Materials Science and Engineering, University of Delaware, Newark, DE 19716, USA |
| |
Abstract: | Silicon-on-insulator (SOI) wafers are commonly used to design microelectronics, energy conversion, and sensing devices. Thin solid films on the surfaces of SOI wafers have been a subject of numerous studies. However, SOI wafers modified by self-assembled monolayers (SAMs) that can also be used as functional device platforms have been investigated to a much lesser extent. In the present work, tert-butoxycarbonyl (t-boc, (CH3)3-C-O-C(O)-)-protected 1-amino-10-undecene monolayers were covalently attached to a H-terminated SOI (1 0 0) surface. The modified wafers were characterized by X-ray photoelectron spectroscopy to confirm the stability of the SAM/Si interface and the integrity of the secondary amine in the SAM. The transmission electron microscopy investigation suggested that this t-boc-protected 1-amino-10-undecene SAM produces atomically flat interface with the 2 μm single crystalline silicon of the SOI wafer, that the SiOx and both available Si/SiOx interfaces are preserved, and that the organic monolayers are stable, with apparent thickness of 1.7 nm, which is consistent with the result of the density functional theory modeling of the molecular features within a SAM. |
| |
Keywords: | Silicon-on-insulator (SOI) Self-assembled monolayers (SAMs) Surface modification X-ray photoelectron spectroscopy (XPS) Transmission electron microscopy (TEM) |
本文献已被 ScienceDirect 等数据库收录! |
|