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Effects of in situ plasma treatment on optical and electrical properties of index-matched transparent conducting oxide layer
Authors:Yong Hwan Lim  Bum Ho Choi  Young Baek Kim  Dong Chan Shin
Affiliation:a National Center for Nanoprocess and Equipments, Honam Technology Division, Korea Institute of Industrial Technology, 1110-9, Oryong-dong Buk-gu, Gwangju 500-480, Republic of Korea
b Department of Advanced Material Science and Technology, Chosun University, Gwangju 501-759, Republic of Korea
Abstract:We investigated the effects of in situ plasma-treatment on optical and electrical properties of index-matched indium tin oxide (IMITO) thin film. To render the IMITO-coated surface hydrophilic and study the optical and electrical characteristics, we performed in situ oxygen plasma post-treatment without breaking vacuum. The 94.6% transmittance in the visible wavelength range (400-700 nm) increased on average to 96.4% and the maximum transmittance reached 98% over a broad wavelength range. The surface roughness and sheet resistance improved from 0.9 nm and 200 Ω/sq to 0.0905 nm and 100 Ω/sq, respectively, by in situ plasma post-treatment. We confirmed by contact angle measurement that the hydrophobic IMITO surface was altered to hydrophilic. The improved optical and electrical characteristics of in situ plasma-treated IMITO makes it adequate for high-resolution liquid crystal on silicon displays.
Keywords:IMITO   LCoS   In situ plasma treatment
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