Improving mechanical properties of a-CNx films by Ti-TiN/CNx gradient multilayer |
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| Authors: | D.G. Liu C.F. Hong C.D. Gu Y.J. Mai R. Chen |
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| Affiliation: | State Key Laboratory of Silicon Materials and Department of Materials Science and Engineering, Zhejiang University, Zheda Road 38, Hangzhou, Zhejiang Province 310027, China |
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| Abstract: | ![]()
Amorphous carbon nitride (a-CNx) films with functional gradient Ti-TiN/CNx underlayer were deposited by direct current magnetron sputtering. Microstructure and composition of the films were characterized by means of X-ray diffraction (XRD), Raman spectroscopy, atomic force microscope (AFM) and transmission electron microscopy (TEM). Mechanical and tribological properties were investigated by nanoindenter, scratch and ball-on-disk tribometer. The a-CNx-based films suffer a graphitization process with the increasing deposition temperature, thus the hardness and elastic modulus decrease. With the design of the Ti-TiN/CNx gradient underlayers, some important advantages of relatively thick CNx films can be achieved, such as increased hardness, improved adhesion strength, and the wear resistance of the a-CNx-based films can be also improved significantly. |
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| Keywords: | Gradient multilayer Carbon nitride Friction and wear |
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