Deposition and wettability of silver nanostructures on Si(1 0 0) substrate based on galvanic displacement reactions |
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| Authors: | CD Gu JP Tu |
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| Institution: | a State Key Laboratory of Silicon Materials, Department of Materials Science and Engineering, Zhejiang University, No. 38 Zheda Road, Hangzhou, China
b Department of Mechanical Engineering, Hong Kong University of Science and Technology, Clearwater Bay, Kowloon, Hong Kong SAR, PR China |
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| Abstract: | A new route for silver electroless deposition on Si(1 0 0) substrate is developed based on the galvanic displacement process. The basic electroless bath contains NaF and AgNO3 with different concentrations. The morphologies of electrolessly deposited silver nanostructures, including silver nanowires and nanoparticles, are strongly dependent on the electrolyte composition. Adding an excess dosage of polyvinylpyrrolidone into the basic electrolyte yields final silver films of porous structures composed by multitudinous Ag nanoparticles. The porous silver films possess the surface hydrophobic property after the modification with n-dodecanethiol. Unidirectional wetting and spreading of a water droplet are also demonstrated on the patterned porous Ag films. |
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| Keywords: | Electroless silver deposition Silicon Hydrophobic Unidirectional wetting Silver nanowires |
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