Procedure for Studying the Steady-State Kinetics of Oxidation of Gaseous Substrates by Hydrogen Peroxide in a Liquid Phase

A procedure was developed for studying the steady-state kinetics of oxidation of various gaseous substrates by hydrogen peroxide under conditions of the continuous release of gaseous products. The steady state of a system was provided by continuously injecting hydrogen peroxide at low conversions of the oxidized substrate. The process was monitored by measuring substrate losses in a gas phase rather than the buildup of products. This allowed us to avoid difficulties associated with further oxidation of the products.