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Ambiguous anti-fouling surfaces: Facile synthesis by light-mediated radical polymerization |
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| Authors: | Christian W. Pester Justin E. Poelma Benjaporn Narupai Shrayesh N. Patel Gregory M. Su Thomas E. Mates Yingdong Luo Christopher K. Ober Craig J. Hawker Edward J. Kramer |
| Affiliation: | 1. Materials Department, University of California, Santa Barbara, California, 93106 Materials Research Laboratory, University of California, Santa Barbara, California, 93106 Department of Chemical Engineering, University of California, Santa Barbara, California, 93106;2. Materials Department, University of California, Santa Barbara, California, 93106 Materials Research Laboratory, University of California, Santa Barbara, California, 93106;3. Materials Department, University of California, Santa Barbara, California, 93106;4. Materials Department, University of California, Santa Barbara, California, 93106 Department of Chemical Engineering, University of California, Santa Barbara, California, 93106;5. Materials Department, University of California, Santa Barbara, California, 93106 Department of Chemistry and Biochemistry, University of California, Santa Barbara, California, 93106;6. Department of Materials Science and Engineering, Cornell University, Ithaca, New York, 14853 |
| Abstract: | In an attempt to create a polymer brush-based platform for the systematic study for anti-biofouling surfaces, the benefits of surface initiated, visible light-mediated radical polymerization are utilized to fabricate well-defined, chemically ambiguously patterned surfaces. A variety of analytical tools are used to illustrate the precise tuning of surface chemistry and thoroughly characterize spatially well-defined, hydrophilic/hydrophobic surfaces composed of poly(ethylene glycol methacrylate) and poly(trifluoroethyl methacrylate) with chemical definition on the micron scale. Advantages of both visible light-mediated photopolymerization and traditional copper-catalyzed atom transfer radical polymerization are combined to achieve both high spatial control and expanded monomer tolerance. © 2015 Wiley Periodicals, Inc. J. Polym. Sci., Part A: Polym. Chem. 2016, 54, 253–262 |
| Keywords: | block copolymers fluoropolymers lithography microstructure mass spectrometry photopolymerization radical polymerization surfaces X-ray |