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Gallium and oxygen accumulations on gallium nitride surfaces following argon ion milling in ultra-high vacuum conditions
Authors:K. S. A. Butcher   Afifuddin   T. L. Tansley   N. Brack   P. J. Pigram   H. Timmers   K. E. Prince  R. G. Elliman
Affiliation:

a Department of Physics, Macquarie University, North Ryde, NSW 2109, Australia

b Centre for Materials and Surface Science, La Trobe University, Melbourne, Vic. 3086, Australia

c School of Physics, University of New South Wales at the Australian Defence Force Academy, Canberra, ACT 2600, Australia

d Australian Nuclear Science and Technology Organisation, Private Mail Bag 1, Menai, NSW 2234, Australia

e Department of Electronic Materials Engineering, Research School of Physical Sciences and Engineering, Australian National University, Canberra, ACT 2600, Australia

Abstract:
Metallic gallium was observed on the surfaces of GaN commercial samples following argon ion milling. SIMS measurements confirmed that the commercial GaN had approximately 0.02% bulk oxygen present. The SIMS signal was standardized using a specimen of known oxygen content, as determined by elastic recoil detection analysis using 200 MeV heavy ions of 197Au. Despite this 2–5% oxygen was observed by XPS in the bulk of the GaN after the argon ion milling. This oxygen is believed to be from the original surface oxide that re-cycles on the GaN surface during the ion milling.
Keywords:Gallium nitride   Argon ion milling   Ultra-high vacuum
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