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Study of the plasma plume generated during near IR femtosecond laser irradiation of silicon targets |
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| Authors: | S. Amoruso C. Altucci R. Bruzzese C. de Lisio N. Spinelli R. Velotta M. Vitiello X. Wang |
| Affiliation: | (1) Coherentia-INFM, Complesso Universitario di Monte S. Angelo, Ed. G Via Cintia, 80126 Napoli, Italy;(2) Istituto Nazionale per la Fisica della Materia (INFM) – Unità di Napoli and Dipartimento di Scienze Fisiche, Università degli Studi di Napoli Federico II, Complesso Universitario di Monte S. Angelo, Via Cintia, 80126 Napoli, Italy |
| Abstract: | Ti:sapphire femtosecond laser ablation of silicon has been investigated by Langmuir probe and time-gated optical emission spectroscopy. The measured spectra show the presence of a fast ion population preceding the main plume core of slow ions and neutrals produced by a thermal ablation mechanism. By analyzing the fluence thresholds for the emission of the two ion populations, we provide clear experimental evidence that fast ions are ejected non-thermally from the sample surface as a result of the Si surface supercritical state induced by the intense ultrashort laser pulse irradiation. PACS 52.50.Jm; 52.38.Mf; 79.20.Ds; 61.82.Fh |
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