| 微束斑X射线源发射系统的数值计算 |
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| 引用本文： | 王凯歌,牛憨笨,张同意. 微束斑X射线源发射系统的数值计算[J]. 光子学报, 2001, 30(1): 62-66 |
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| 作者姓名： | 王凯歌 牛憨笨 张同意 |
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| 作者单位： | 1. 中国科学院西安光学精密机械研究所光电子部，西安 710068
2. 西安电子科技大学技术物理系，西安 |
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| 摘 要： | 本文采用边界元法(BEM)对高亮度微束斑X射线源的LaB6阴极、Wehnet栅极和阳极等发射系统的电位和场强分布进行了数值计算,首先计算了系统对称轴上的电位,再利用三次样条插值法和谢赫尔公式等计算了系统在考虑三次相差情况下的傍轴电场强度分布.
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| 关 键 词： | 微束班X射线源 边界元法 LaB6阴极 Wehnet栅级 |
| 收稿时间： | 2000-04-18 |
| 修稿时间： | 2000-04-18 |
EMITTING SYSTEM IN X-RAY SOURCE WITH MICRO-BEAM |
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| Wang Kaige. EMITTING SYSTEM IN X-RAY SOURCE WITH MICRO-BEAM[J]. Acta Photonica Sinica, 2001, 30(1): 62-66 |
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| Authors: | Wang Kaige |
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| Affiliation: | Xi’an Institute of Optics & Precision Mechanics, Academia Sinica, Xi’an 710068 |
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| Abstract: | The Emitting system which is consist LaB 6 cathed,grid and anode is very vital for the study of X ray source with micro beam.The axial protential of emiting system has been calculated by boundary element method (BEM) and the whole eletricifield done by cubic spline interpolation,finially,the eletron trajectory was traced by Runge Kutta method. |
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| Keywords: | X ray source with micro beam Emitting system Boundary element method Wehnet grid system |
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