Adaptive synthesis of optical pattern for photonic crystal lithography |
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Authors: | P. Q. Zhang X. S. Xie Y. F. Guan J. Y. Zhou K. S. Wong L. Yan |
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Affiliation: | (1) Fraunhofer Institute for Material and Beam Technology (IWS), Winterbergstr 28, 01277 Dresden, Germany |
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Abstract: | The two-photon absorption spectrum and cross-section (δ) for ruby (Cr3+:sapphire) have been measured over the 0.8–1.2 μm wavelength range at 25°C. Absolute values of δ were obtained by comparing the fluorescence yield for two-photon excitation with that for single-photon excitation of the same ionic transition under identical illumination conditions. The maximum values of δ are 4.6×10−3 GM for o-polarisation and 5.9×10−3 GM for e-polarisation at 840 nm. The relevance of these measurements to distributed optical fibre sensing is briefly discussed. |
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