Thin ferroelectric films: Preparation and prospects of integration |
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| Authors: | A S Sigov E D Mishina and V M Mukhortov |
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| Institution: | (1) Department of Electrical and Electronic Engineering, Meijo University, Tempaku, Nagoya, 468-8502 Nagoya, Japan;(2) Department of Electrical Engineering and Computer Science, Nagoya University, Chikusa, Nagoya, 464-8603 Nagoya, Japan |
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| Abstract: | The properties of (Ba,Sr)TiO3 and BiFeO3 thin films and related nanostructures have been considered. The films have been prepared by rf sputtering in an oxygen atmosphere
at an elevated pressure, and the nanostructures have been produced using focused ion-beam etching. The electric field has
been applied across a planar interdigital structure of electrodes. The structure, dielectric, electro-optical, and nonlinear
optical properties of the prepared samples have been investigated over wide ranges of thicknesses and electric field frequencies.
The high efficiency of the planar switching and its influence on the optical properties of the produced structures have been
demonstrated. The nanostructuring makes it possible to change the dielectric and optical properties of the materials under
investigation, thus increasing the range of switching of functional parameters. |
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