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Effects of strain field in nitrogen-mediated Co film growth on Cu(0 0 1): Segregation and electronic structure change
Authors:Daiichiro Sekiba   Shunsuke Doi   Kan Nakatsuji  Fumio Komori
Affiliation:

Institute for Solid State Physics, University of Tokyo, Kashiwanoha 5-1-5, Kashiwashi, Chiba 277-8581, Japan

Abstract:
Growth modes of Co thin films on the both N-saturated and partially N-adsorbed Cu(0 0 1) surfaces are studied in detail. From results of the STM and XPS measurements, segregation of N atoms depending on the Co island size is concluded. This new type of atom segregation is explained by means of a lattice strain of the substrate due to the small Co island formation. A novel core-level shift of N 1s during the Co film growth is also reported. A possible influence of the lattice strain to the electronic structure of the surfactant is discussed.
Keywords:Models of surface kinetics   Low energy electron diffraction (LEED)   Ion implantation methods   X-ray photoelectron spectroscopy   Scanning tunneling microscopy   Epitaxy   Growth   Nanopatterning   Surface segregation   Surface stress   Surface tension   Cobalt   Copper   Nitrogen atom   Thin film structures   Metal–metal interface   Metal–metal magnetic thin film structures
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