Loss of trace impurities during NAA of liquid reagents |
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Authors: | Kil Yong Lee Yoon Yeol Yoon Sang Ki Chun Nak Bae Kim Keung Shik Park Gae Ho Lee |
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Affiliation: | (1) Korea Institute of Geology, Mining and Materials, 30 Kajung-dong, Yusong-gu, 305-350 Taejon, Korea;(2) Department of Chemistry, Chungnam National University, 220 Gung-dong, Yusong-gu, 205-746 Taejon, Korea |
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Abstract: | The loss of trace elements during NAA of five liquid reagents, hydrofluoric acid, hydrochloric acid, nitric acid, hydrogen peroxide and deioniyed water, has been investigated using 17 radioactive tracers of46Sc,51Cr,54Mn,59Fe,60Co,645Zn,75Se,85Sr,95Zr,113Sn,124Sb,151Eu,160Yb,177Lu,182Ta,233Pa. Two kinds of container quartz and polyethylene have been used for irradiation and also for preconcentration of the reagents. The containers were cleaned before use by washing-leaching-rinsing procedure. The reagents were preconcentrated by subboiling evaporation under the infrared lamp in clean bench. The loss of trace elements has been revealed to be severer for the reagents of hydrochloric acid and nitric acid in the container of quartz than for the other cases, while that is lowest for hydrogen peroxide. |
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