Direct current magnetron sputter-deposited ZnO thin films |
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Authors: | Jian-Wei HoonKah-Yoong Chan Jegenathan KrishnasamyTeck-Yong Tou Dietmar Knipp |
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Institution: | a Faculty of Engineering, Multimedia University, Persiaran Multimedia, 63100 Cyberjaya, Selangor, Malaysia b School of Engineering and Science, Jacobs University Bremen, 28759 Bremen, Germany |
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Abstract: | Zinc oxide (ZnO) is a very promising electronic material for emerging transparent large-area electronic applications including thin-film sensors, transistors and solar cells. We fabricated ZnO thin films by employing direct current (DC) magnetron sputtering deposition technique. ZnO films with different thicknesses ranging from 150 nm to 750 nm were deposited on glass substrates. The deposition pressure and the substrate temperature were varied from 12 mTorr to 25 mTorr, and from room temperature to 450 °C, respectively. The influence of the film thickness, deposition pressure and the substrate temperature on structural and optical properties of the ZnO films was investigated using atomic force microscopy (AFM) and ultraviolet-visible (UV-Vis) spectrometer. The experimental results reveal that the film thickness, deposition pressure and the substrate temperature play significant role in the structural formation and the optical properties of the deposited ZnO thin films. |
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Keywords: | ZnO Sputtering Optical properties Structural properties |
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