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125 MeV Si ion irradiation of calcium phosphate thin film coated by rf-magnetron sputtering technique |
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| Authors: | K ElayarajaMI Ahymah Joshy RV SuganthiS Narayana Kalkura M PalanichamyM Ashok VV SivakumarPK Kulriya I SulaniaD Kanjilal K Asokan |
| Institution: | a Crystal Growth Centre, Anna University, Sardar Patel Road, Chennai 600025, Tamil Nadu, India b Department of Chemistry, Anna University, Chennai 600025, Tamil Nadu, India c Department of Physics, National Institute of Technology, Tiruchirappalli 620015, Tamil Nadu, India d Inter-University Accelerator Center, Aruna Asaf Ali Marg, New Delhi 110067, India |
| Abstract: | Titanium substrate was coated with hydroxyapatite by radiofrequency magnetron sputtering (rf-magnetron sputtering) technique and subjected to swift heavy ion (SHI) irradiation of 125 MeV with Si9+ at fluences of 1 × 1010, 1 × 1011 and 1 × 1012 ions/cm2. The glancing incidence X-ray diffraction (GIXRD) analysis confirmed the HAp phase of the irradiated film. There was a considerable decrease in crystallinity and particle size after irradiation. In addition, DRS-UV reflectance spectra revealed a decrease in optical band gap (Eg) from 5.2 to 4.6 eV. Wettability of biocompatible materials plays an important role in biological cells proliferation for tissue engineering, drug delivery, gene transfer and bone growth. HAp thin films irradiated with 1 × 1011 ions/cm2 fluence showed significant increase in wettability. While the SHI irradiated samples exhibited enhanced bioactivity, there was no significant variation in cell viability. Surface roughness, pores and average particle size were analyzed by atomic force microscopy (AFM). |
| Keywords: | Biomaterials rf-magnetron sputtering Ion beam irradiation Cell viability HAp |
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