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| 衍射现象对高精度偏转器设计的影响 | |
| 引用本文： | 刘珠明,顾文琪. 衍射现象对高精度偏转器设计的影响[J]. 光学技术, 2005, 31(6): 814-816 |
| 作者姓名： | 刘珠明 顾文琪 |
| 作者单位： | 中国科学院电工研究所,北京,100080;中国科学院电工研究所,北京,100080 |
| 基金项目： | 中科院知识创新工程资助项目(KGCX1_Y_8) |
| 摘 要： | 基于波动光学理论,计算了由衍射、球差和色差三者共同作用的电子束斑电流分布,得到了电子束斑的精确信息和电子束曝光机的轴上分辨率。针对某一个具体系统的不同电子束孔径角,以偏转器的位置和相互转角为变量进行了偏转系统的优化设计;综合考虑了电子光学系统的衍射、轴上像差和偏转像差三者与光阑孔径角的不同关系。得到了光柱体的最佳总体性能,保证了电子束曝光机的高分辨率和均匀性。 |
| 关 键 词： | 衍射 束流分布 偏转器设计 |
| 文章编号： | 1002-1582(2005)06-0814-03 |
| 修稿时间： | 2004-09-10 |
Influence of the diffraction on design of high-precision deflectors |
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| LIU Zhu-ming,GU Wen-qi. Influence of the diffraction on design of high-precision deflectors[J]. Optical Technique, 2005, 31(6): 814-816 | |
| Authors: | LIU Zhu-ming GU Wen-qi |
| Abstract: | The current density distribution combined effects of diffraction,spherical aberration,chromatic aberration was computed accurately based on a wave optical theory.And the axial resolution of the electron beam lithography was obtained.With different aperture angle,optimizations were done through adjusting the position and relative strengths of deflectors.Consideration combined with diffraction、 axial aberrations、 deflection aberrations,the high resolution and uniformity of the beam in overall deflection field are guaranteed. |
| Keywords: | diffraction beam current distribution design of deflectors |
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