Electron-beam deposition of vanadium dioxide thin films |
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Authors: | R E Marvel K Appavoo B K Choi J Nag R F Haglund Jr |
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Institution: | 1. Interdisciplinary Materials Science Program, Vanderbilt University, Nashville, TN, 37234-0106, USA 3. Department of Electrical Engineering and Computer Science, Vanderbilt University, Nashville, TN, 37235, USA 4. Department of Physics and Astronomy, Vanderbilt University, Nashville, TN, 37235-1807, USA 2. Institute for Nanoscale Science and Engineering, Vanderbilt University, Nashville, TN, 37234-0106, USA
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Abstract: | Developing a reliable and efficient fabrication method for phase-transition thin-film technology is critical for electronic and photonic applications. We demonstrate a novel method for fabricating polycrystalline, switchable vanadium dioxide thin films on glass and silicon substrates and show that the optical switching contrast is not strongly affected by post-processing annealing times. The method relies on electron-beam evaporation of a nominally stoichiometric powder, followed by fast annealing. As a result of the short annealing procedure we demonstrate that films deposited on silicon substrates appear to be smoother, in comparison to pulsed laser deposition and sputtering. However, optical performance of e-beam evaporated film on silicon is affected by annealing time, in contrast to glass. |
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