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Deposition of amorphous chromium layers |
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| Authors: | Norbert Schr?der Birgit Sonntag Waldfried Plieth |
| Affiliation: | 2. ancosys GmbH, Pharmapark Radebeul, Meissner Str. 191, 01445, Radebeul, Germany 3. Atotech Deutschland GmbH, Erasmusstra?e 20, 10553, Berlin, Germany 1. Physikalische Chemie und Elektrochemie, Technische Universit?t Dresden, 01062, Dresden, Germany |
| Abstract: | Deposition of amorphous chromium-carbon layers is possible from a trivalent chromium electrolyte containing 0.6?mol/l formic acid. The formation of chromium/formic acid complexes inhibits the aging of the electrolyte and the oligomerization. Deposition of a 15–20?μm thick chromium film is possible with DC condition. Thicker films can be deposited with pulse plating using reversed pulse sequences and pulse lengths in the millisecond region. The optimized conditions concerning pulse current densities and pulse times were determined and the composition and morphology of the films investigated. |
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