Nanosphere dispersion on a large glass substrate by low dose ion implantation for localized surface plasmon resonance |
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Authors: | Xiaodong Zhou Kai Yu Liu Nan Zhang Dong-Hwan Kim Christina Tan |
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Institution: | (1) Institute of Materials Research and Engineering, A*STAR (Agency for Science, Technology and Research), 3 Research Link, Singapore, 117602, Singapore;(2) School of Electrical and Electronic Engineering, Nanyang Technological University, 50 Nanyang Avenue, Singapore, 639798, Singapore;(3) Division of Bioengineering, School of Chemical and Biomedical Engineering, Nanyang Technological University, Singapore, 637457, Singapore |
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Abstract: | Dispersing nanospheres on a large glass substrate is the key to fabricate noble metal nanostructures for localized surface
plasmon resonance through dispersed nanosphere lithography. This article reports that by modifying the glass surface with
low dose ion implantation and successively dip coating the surface with poly(diallyldimethyl ammonium chloride) (PDDA), polystyrene
or silica nanospheres can be dispersed on a large glass substrate. Investigation shows that several kinds of ions, such as
silicon, boron, argon, and arsenic, can improve the nanosphere dispersion on glass, attributed to the ion bombardment-caused
silicon increment. Ion implantation imposes no surface roughness or optical loss to the glass substrate, thus this method
is suitable for localized surface plasmon resonance application. Experiments show silicon ion implantation can best disperse
the nanospheres. For the gold nanostructures obtained by obliquely evaporating 30 nm of gold film onto the polystyrene nanospheres,
which are dispersed on a silicon ion implanted glass substrate, a localized surface plasmon resonance sensitivity of 242 nm/RIU
is achieved. |
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