Electron energy distribution functions and rate and transport coefficients of H2/H/CH4 reactive plasmas for diamond film deposition期刊界 All Journals 搜尽天下杂志传播学术成果专业期刊搜索期刊信息化学术搜索

Electron energy distribution functions and rate and transport coefficients of H2/H/CH4 reactive plasmas for diamond film deposition

Authors:	M. Capitelli G. Colonna K. Hassouni A. Gicquel

Affiliation:	(1) Centro di Studio per la Chimica dei Plasmi del CNR and Dipartimento di Chimica dell'Università di Bari, Italy;(2) ZLIMHP, Université de Paris Nord-Villetaneuse, France

Abstract:	Electron energy distribution functions (eedf) and rate and transport coefficients for H₂/H/CH₄ mixtures have been calculated by solving a stationary Boltzmann equation as a function of reduced electric field E/N, of molar fraction, and of different concentrations of electronically excited states. Superelastic electronic collisions superimpose structures to eedf especially for E/N values < 40 Td.

Keywords:	Electron energy distribution function transport coefficients diamond films CH₄/HZ plasma
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